dc.contributor.author | Delie, G. | |
dc.contributor.author | Chiappe, D. | |
dc.contributor.author | Asselberghs, Inge | |
dc.contributor.author | Huyghebaert, Cedric | |
dc.contributor.author | Radu, Iuliana | |
dc.contributor.author | Banerjee, Sreetama | |
dc.contributor.author | Groven, Benjamin | |
dc.contributor.author | Brems, Steven | |
dc.contributor.author | Afanas'ev, V. V. | |
dc.date.accessioned | 2022-06-14T11:01:11Z | |
dc.date.available | 2021-11-02T16:01:31Z | |
dc.date.available | 2022-05-30T08:31:28Z | |
dc.date.available | 2022-06-14T11:01:11Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | 2632-959X | |
dc.identifier.other | WOS:000659104800001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37908.3 | |
dc.source | WOS | |
dc.title | Processing Stability of Monolayer WS2 on SiO2 | |
dc.type | Journal article | |
dc.contributor.imecauthor | Asselberghs, Inge | |
dc.contributor.imecauthor | Huyghebaert, Cedric | |
dc.contributor.imecauthor | Radu, Iuliana | |
dc.contributor.imecauthor | Banerjee, Sreetama | |
dc.contributor.imecauthor | Groven, Benjamin | |
dc.contributor.imecauthor | Brems, Steven | |
dc.contributor.orcidext | Afanas'ev, V. V.::0000-0001-5018-4539 | |
dc.contributor.orcidimec | Huyghebaert, Cedric::0000-0001-6043-7130 | |
dc.contributor.orcidimec | Radu, Iuliana::0000-0002-7230-7218 | |
dc.contributor.orcidimec | Banerjee, Sreetama::0000-0002-6297-9547 | |
dc.contributor.orcidimec | Groven, Benjamin::0000-0002-5781-7594 | |
dc.contributor.orcidimec | Brems, Steven::0000-0002-0282-8528 | |
dc.identifier.doi | 10.1088/2632-959X/ac022b | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 024004 | |
dc.source.journal | NANO EXPRESS | |
dc.source.issue | 2 | |
dc.source.volume | 2 | |
imec.availability | Published - open access | |