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Processing Stability of Monolayer WS2 on SiO2
dc.contributor.author | Delie, G. | |
dc.contributor.author | Chiappe, D. | |
dc.contributor.author | Asselberghs, I | |
dc.contributor.author | Huyghebaert, C. | |
dc.contributor.author | Radu, I | |
dc.contributor.author | Banerjee, S. | |
dc.contributor.author | Groven, B. | |
dc.contributor.author | Brems, S. | |
dc.contributor.author | Afanas'ev, V. V. | |
dc.date.accessioned | 2021-11-02T16:01:31Z | |
dc.date.available | 2021-11-02T16:01:31Z | |
dc.date.issued | 2021-JUN 1 | |
dc.identifier.other | WOS:000659104800001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37908 | |
dc.source | WOS | |
dc.title | Processing Stability of Monolayer WS2 on SiO2 | |
dc.type | Journal article | |
dc.contributor.imecauthor | Chiappe, D. | |
dc.contributor.imecauthor | Asselberghs, I | |
dc.contributor.imecauthor | Huyghebaert, C. | |
dc.contributor.imecauthor | Radu, I | |
dc.contributor.imecauthor | Banerjee, S. | |
dc.contributor.imecauthor | Groven, B. | |
dc.contributor.imecauthor | Brems, S. | |
dc.contributor.orcidext | Afanas'ev, V. V.::0000-0001-5018-4539 | |
dc.contributor.orcidimec | Huyghebaert, C.::0000-0001-6043-7130 | |
dc.identifier.doi | 10.1088/2632-959X/ac022b | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.journal | NANO EXPRESS | |
dc.source.issue | 2 | |
dc.source.volume | 2 | |
imec.availability | Under review |
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