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dc.contributor.authorLin, Pin-Cheng
dc.contributor.authorVillarreal, Renan
dc.contributor.authorBana, Harsh
dc.contributor.authorZarkua, Zviadi
dc.contributor.authorHendriks, Vince
dc.contributor.authorTsai, Hung-Chieh
dc.contributor.authorAuge, Manuel
dc.contributor.authorJunge, Felix
dc.contributor.authorHofsaess, Hans
dc.contributor.authorTosi, Ezequiel
dc.contributor.authorLacovig, Paolo
dc.contributor.authorLizzit, Silvano
dc.contributor.authorZhao, Wenjuan
dc.contributor.authorDi Santo, Giovanni
dc.contributor.authorPetaccia, Luca
dc.contributor.authorDe Feyter, Steven
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBrems, Steven
dc.contributor.authorPereira, Lino M. C.
dc.date.accessioned2022-07-14T02:30:13Z
dc.date.available2022-07-14T02:30:13Z
dc.date.issued2022-JUN 14
dc.identifier.issn1932-7447
dc.identifier.otherWOS:000821155200001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40114
dc.sourceWOS
dc.titleThermal Annealing of Graphene Implanted with Mn at Ultralow Energies: From Disordered and Contaminated to Nearly Pristine Graphene
dc.typeJournal article
dc.typeJournal article (pre-print)
dc.identifier.doi10.1021/acs.jpcc.2c00855
dc.source.numberofpages12
dc.source.peerreviewyes
dc.source.journalJOURNAL OF PHYSICAL CHEMISTRY C
imec.availabilityUnder review


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