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Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography
dc.contributor.author | Lodha, Jayant Kumar | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Vallat, Remi | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Armini, Silvia | |
dc.date.accessioned | 2022-10-04T02:53:42Z | |
dc.date.available | 2022-10-04T02:53:42Z | |
dc.date.issued | 2022-DEC 30 | |
dc.identifier.issn | 0169-4332 | |
dc.identifier.other | WOS:000859714800004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40532 | |
dc.source | WOS | |
dc.title | Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lodha, Jayant Kumar | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Vallat, Remi | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Armini, Silvia | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.contributor.orcidimec | Armini, Silvia::0000-0003-0578-3422 | |
dc.identifier.doi | 10.1016/j.apsusc.2022.154657 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.journal | APPLIED SURFACE SCIENCE | |
dc.source.volume | 606 | |
imec.availability | Under review |
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