dc.contributor.author | Melvin III, Lawrence S. | |
dc.contributor.author | Jonckheere, Rik | |
dc.date.accessioned | 2023-03-16T10:12:59Z | |
dc.date.available | 2023-03-01T03:27:53Z | |
dc.date.available | 2023-03-09T08:46:39Z | |
dc.date.available | 2023-03-16T10:12:59Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000924949300026 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41208.3 | |
dc.source | WOS | |
dc.title | Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.date.embargo | 2022-10-31 | |
dc.identifier.doi | 10.1117/1.JMM.21.4.044401 | |
dc.source.numberofpages | 19 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 044401 | |
dc.source.endpage | na | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 4 | |
dc.source.volume | 21 | |
imec.availability | Published - open access | |