dc.contributor.author | Kundu, Shreya | |
dc.contributor.author | Garbin, Daniele | |
dc.contributor.author | Devulder, Wouter | |
dc.contributor.author | Donadio, Gabriele Luca | |
dc.contributor.author | Lazzarino, Frederic | |
dc.date.accessioned | 2023-08-24T12:50:49Z | |
dc.date.available | 2023-07-20T17:16:30Z | |
dc.date.available | 2023-08-24T12:50:49Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 2574-0970 | |
dc.identifier.other | WOS:001010275800001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42179.2 | |
dc.source | WOS | |
dc.title | High-Density Nanopatterning of SiGeAsTe Chalcogenide as Ovonic Threshold Switch Selectors for Memory Applications | |
dc.type | Journal article | |
dc.contributor.imecauthor | Kundu, Shreya | |
dc.contributor.imecauthor | Garbin, Daniele | |
dc.contributor.imecauthor | Devulder, Wouter | |
dc.contributor.imecauthor | Donadio, Gabriele Luca | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.orcidimec | Kundu, Shreya::0000-0001-8052-7774 | |
dc.contributor.orcidimec | Garbin, Daniele::0000-0002-5884-1043 | |
dc.contributor.orcidimec | Devulder, Wouter::0000-0002-5156-0177 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.contributor.orcidimec | Donadio, Gabriele Luca::0000-0003-1435-3897 | |
dc.identifier.doi | 10.1021/acsanm.3c01611 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 10668 | |
dc.source.endpage | 10679 | |
dc.source.journal | ACS APPLIED NANO MATERIALS | |
dc.source.issue | 12 | |
dc.source.volume | 6 | |
imec.availability | Published - imec | |
dc.description.wosFundingText | We acknowledge the support of IMEC's Industrial Affiliation Program (IIAP) and the Active memory program. The authors would like to thank Ludovic Goux, Gouri Sankar Kar, and Romain Delhougne of the Active memory program, IMEC for providing a brief overview of the intended applications and integration of chalcogenide-based OTS devices. We also acknowledge the support of IMEC's pilot line, SEM, and MCA team for help with fabrication and characterization processes. | |