Highly Localized Charges of Confined Electrical Double-Layers Inside 0.7-nm Layered Channels
dc.contributor.author | Chen, Bin | |
dc.contributor.author | Zhai, Zhaofeng | |
dc.contributor.author | Huang, Nan | |
dc.contributor.author | Zhang, Chuyan | |
dc.contributor.author | Yu, Siyu | |
dc.contributor.author | Liu, Lusheng | |
dc.contributor.author | Yang, Bing | |
dc.contributor.author | Jiang, Xin | |
dc.contributor.author | Yang, Nianjun | |
dc.date.accessioned | 2024-02-01T09:39:16Z | |
dc.date.available | 2023-08-21T18:00:49Z | |
dc.date.available | 2024-02-01T09:39:16Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 1614-6832 | |
dc.identifier.other | WOS:001044772400001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42379.2 | |
dc.source | WOS | |
dc.title | Highly Localized Charges of Confined Electrical Double-Layers Inside 0.7-nm Layered Channels | |
dc.type | Journal article | |
dc.identifier.doi | 10.1002/aenm.202300716 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 2300716 | |
dc.source.endpage | N/A | |
dc.source.journal | ADVANCED ENERGY MATERIALS | |
dc.source.issue | 36 | |
dc.source.volume | 13 | |
imec.availability | Published - imec | |
dc.description.wosFundingText | The authors thank for Prof. Zhongshuai Wu in Dalian Institute of Chemical Physics, Chinese Academy of Sciences and Prof. Bingsen Zhang in Institute of Metal Research, Chinese Academy of Sciences for the discussion of the electrical double-layer capacitance. This work was supported by the National Natural Science Foundation of China (No. 51202257) and N. Y. thanks the financial support from Deutsche Forschungsgemeinschaft (DFG, German Research Foundation, No. 457444676). |
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