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Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film

dc.contributor.authorTravaly, Youssef
dc.contributor.authorEyckens, Brenda
dc.contributor.authorCarbonell, Laure
dc.contributor.authorRothschild, Aude
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorCiofi, Ivan
dc.contributor.authorStruyf, Herbert
dc.contributor.authorFurukawa, Yukiko
dc.contributor.authorStucchi, Michele
dc.contributor.authorSchaekers, Marc
dc.contributor.authorBender, Hugo
dc.contributor.authorRosseel, Erik
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.contributor.authorGaillard, F.
dc.contributor.authorVan Autryve, Luc
dc.contributor.authorRabinzohn, P.
dc.date.accessioned2021-10-14T23:23:37Z
dc.date.available2021-10-14T23:23:37Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6888
dc.sourceIIOimport
dc.titleImpact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
dc.typeJournal article
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVan Autryve, Luc
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage367
dc.source.endpage374
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume64
imec.availabilityPublished - imec
imec.internalnotesMAM2002; Vaals, The Netherlands, 3-6 March 2002


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