Browsing by author "Schepers, Bart"
Now showing items 1-4 of 4
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Atomic layer deposition of tantalum oxide and tantalum silicate from chloride precursors
Adelmann, Christoph; Delabie, Annelies; Schepers, Bart; Rodriguez, Leonard; Franquet, Alexis; Conard, Thierry; Opsomer, Karl; Vaesen, Inge; Moussa, Alain; Pourtois, Geoffrey; Pierloot, Christine; Caymax, Matty; Van Elshocht, Sven (2012) -
Atomic-layer-deposited tantalum silicate as a gate dielectric for III-V MOS devices
Adelmann, Christoph; Lin, Dennis; Nyns, Laura; Schepers, Bart; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty (2011) -
In depth analysis of 3D NAND enablers in gate stack integration and demonstration in 3D devices
Tan, Chi Lim; Lavizzari, Simone; Blomme, Pieter; Breuil, Laurent; Vecchio, Emma; Sebaai, Farid; Paraschiv, Vasile; Tao, Zheng; Schepers, Bart; Nyns, Laura; Peter, Antony; Dekkers, Harold; Ong, Patrick; Tsvetanova, Diana; Devriendt, Katia; Teugels, Lieve; Heylen, Nancy; Raymaekers, Tom; Jossart, Nico; Mennella, Pasquale; Delhougne, Romain; Vadakupudhu Palayam, Senthil; Arreghini, Antonio; Van den Bosch, Geert; Furnemont, Arnaud (2017) -
Process characterization for donut TSV's
Slabbekoorn, John; Schepers, Bart; Sardo, Stefano; Van Huylenbroeck, Stefaan; Vandeweyer, Tom; Miller, Andy; Rebibis, Kenneth June; Flack, Warren; Kenyon, Gareth; Hsieh, Robert; Ranjan, Manish (2014)