Now showing items 1-4 of 4

    • Calibrated PSCAR stochastic simulation 

      Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019)
    • Increasing the predictability of AIMS measurements by coupling to resist simulations 

      Meliorisz, Balint; Erdmann, Andreas; Schnattinger, Thomas; Strössner, Ulrich; Scherübl, Thomas; De Bisschop, Peter; Philipsen, Vicky (2008)
    • Mask aligner lithography simulation 

      Duval, Fabrice; Miller, Andy; Slabbekoorn, John; Maenhoudt, Mireille; Meliorisz, Balint; Ritter, Daniel; Unal, Nezih (2010)
    • Mask aligner lithography simulation 

      Duval, Fabrice; Meliorisz, Balint; Slabbekoorn, John; Maenhoudt, Mireille; Miller, Andy; Unal, Nezih; Ritter, Daniel (2010)