Browsing by author "Shindo, Hiroyuki"
Now showing items 1-5 of 5
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Dry Resist Metrology Readiness for High-NA EUVL
Lorusso, Gian; Van den Heuvel, Dieter; Zidan, Mohamed; Moussa, Alain; Beral, Christophe; Charley, Anne-Laure; De Simone, Danilo; De Silva, Anuja; Verveniotis, Elisseos; Haider, Ali; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Isawa, Miki (2023) -
High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; De Bisschop, Peter; Van de Kerkhove, Jeroen (2010) -
High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; Van de Kerkhove, Jeroen; De Bisschop, Peter (2011-02) -
High-precision contouring from SEM image in 32-nm lithography and beyond
Shindo, Hiroyuki; Sugiyama, Akiyuki; Komuro, Hitoshi; Hojyo, Yutaka; Matsuoka, Ryoichi; Sturtevant, John; Do, Thuy; Kusnadi, Ir; Fenger, Germain; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
Regularized Autoencoder for The Analysis of Multivariate Metrology Data
Saib, Mohamed; Lorusso, Gian; Charley, Anne-Laure; Leray, Philippe; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Ban, Naoma; Ikota, Masami (2022)