Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Conference contributions
View item
imec Publications Repository
imec Publications
Conference contributions
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
View/
open
20403.pdf (2.442Mb)
Metadata
Show full item record
Authors
Hibino, Daisuke
;
Shindo, Hiroyuki
;
Abe, Yuuichi
;
Hojyo, Yutaka
;
Fenger, Germain
;
Do, Thuy
;
Kusnadi, Ir
;
Sturtevant, John L.
;
De Bisschop, Peter
;
Van de Kerkhove, Jeroen
Conference
Metrology, Inspection and Process Control for Microlithography XXIV
Title
High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections
Conference contributions
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login