Publication:
High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
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1938 since deposited on 2021-10-18
4last month
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Acq. date: 2026-05-20
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Statistics
Views
1938 since deposited on 2021-10-18
4last month
1last week
Acq. date: 2026-05-20
Citations