Publication:

High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography

Date

2010

Proceedings Paper

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Files

20403.pdf 2.44 MB

Author(s)

Hibino, Daisuke

;

Shindo, Hiroyuki

;

;

;

Fenger, Germain

;

;

;

Sturtevant, John L.

;

De Bisschop, Peter

;

Van de Kerkhove, Jeroen

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1933 since deposited on 2021-10-18

Acq. date: 2026-02-27