Browsing by author "Melvin III, Lawrence S."
Now showing items 1-3 of 3
-
Binary modeling method to check the sub-resolution assist features (SRAFs) printability
Li, Jianliang; Gao, Weimin; Fan, Yongfa; Xue, Jing; Yan, Qiliang; Lucas, Kevin; De Bisschop, Peter; Melvin III, Lawrence S. (2012) -
Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness
Ohtomi, Eisuke; Philipsen, Vicky; Welling, Ulrich; Melvin III, Lawrence S.; Takahata, Yosuke; Tanaka, Yusuke; De Simone, Danilo (2023) -
Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithography
Melvin III, Lawrence S.; Jonckheere, Rik (2022)