Browsing by author "Sewell, H."
Now showing items 1-2 of 2
-
32nm node technology development using interference immersion lithography
Sewell, H.; McCafferty, D.; Markoya, L.; Hendrickx, Eric; Hermans, Jan; Ronse, Kurt (2005) -
Status and critical challenges for 157nm lithography
Ronse, Kurt; De Bisschop, Peter; Goethals, Mieke; Hermans, Jan; Jonckheere, Rik; Light, Scott; Okoroanyanwu, Uzo; Watso, Robert; McAfferty, D.; Ivaldi, J.; Oneil, T.; Sewell, H. (2004)