Browsing by author "Kal, Subhadeep"
Now showing items 1-4 of 4
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Controlled isotropic etches for Gate-All-Around (GAA) device architectures
Muraki, Yusuke; Oniki, Yusuke; Kenis, Karine; Altamirano Sanchez, Efrain; Holsteyns, Frank; Kal, Subhadeep; Alix, Cheryl; Kumar, Kaushik; Mosden, Aelan (2020) -
Enabling complimentary FET (CFET) fabrication: selective, isotropic etch of Group IV semiconductors
Kal, Subhadeep; Oniki, Yusuke; Falugh, Matthew; Pereira, Cheryl; Wang, Qi; Holsteyns, Frank; Smith, Jeffrey; Mosden, Aelan; Kumar, Kaushik; Boemmels, Juergen; Ryckaert, Julien; Biolsi, Peter; Hurd, Trace Q (2019) -
Selective isotropic etching of Group IV semiconductors to enable gate all around device architectures
Kal, Subhadeep; Pereira, Cheryl; Oniki, Yusuke; Holsteyns, Frank; Smith, Jeffrey; Mosden, Aelan; Kumar, Kaushik; Biolsi, Peter; Hurd, Trace Q. (2018) -
Si trim applications: benefits and challenges
Kal, Subhadeep; Oniki, Yusuke; Pereira, Cheryl; Holsteyns, Frank; Chanemougame, Daniel; Mosden, Aelan; Kumar, Kaushik; Biolsi, Peter; Hurd, Trace Q. (2019)