Now showing items 1-5 of 5

    • CMP Slurries for germanium substrates in FEOL applications 

      Ong, Patrick; Siebert, Joerg Max; Noller, Bastian; Lan, Yongqing; Lauter, Michael; Proells, Julian; Huang, Kevin; Usman Ibrahim, Sheik Ansar (2013)
    • Ge CMP process development 

      Ong, Patrick; Leunissen, Peter; Ansar, Sheik; Gillot, Christophe; Lan, Yongqing; Noller, Bastian; Li, Yuzhuo (2012)
    • Ge, III/V Materials CMP 

      Ong, Patrick; Lan, Yongqing; Noller, Bastian; Gillot, Christophe; Usman Ibrahim, Ansar; Lauter, Michael; Golzarian, Reza; Li, Yuzhuo (2012)
    • III-V CMP process development 

      Ong, Patrick; Ansar, Sheikh; Gillot, Christophe; Lan, Yongqing; Teugels, Lieve; Waldron, Niamh; Proelss, Julian (2013)
    • III/V CMP process development 

      Ong, Patrick; Usman Ibrahim, Ansar; Gillot, Christophe; Lan, Yongqing; Teugels, Lieve; Waldron, Niamh; Proelss, Julian (2013)