Browsing by author "Cangemi, Michael"
Now showing items 1-2 of 2
-
Impact of AAPSM etch depth linearity in ArF immersion lithography
Cangemi, Michael; Philipsen, Vicky; Leunissen, Peter; De Ruyter, Rudi; Jonckheere, Rik; Martin, Patrick; Wakefield, Clare; Buxbaum, Alex; Morisson, Troy (2005) -
Mask blank stress birefringence requirements for hyper-NA lithography
Leunissen, Peter; Philipsen, Vicky; De Ruyter, Rudi; Demarteau, M.; van de Kerkhof, M.; de Boeij, Wim; Waelpoel, J.; Martin, Patrick; Cangemi, Michael (2005)