Browsing by author "Polli, M."
Now showing items 1-2 of 2
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Reticle imaging and metrology using a CD-SEM at IMEC
James, A.; Felten, F.; Polli, M.; England, J.; Marschner, Thomas; Vandenberghe, Geert (2000) -
Role of LV-SEM reticle CD measurements on DUV lithography
Marschner, Thomas; Pollentier, Ivan; Potoms, Goedele; Jonckheere, Rik; Ronse, Kurt; Polli, M. (1999)