Browsing by author "Kelly, John"
Now showing items 1-4 of 4
-
Nanoscale etching of GaAs and InP in acidic H2O2 solution: a striking contrast in kinetics and surface chemistry
van Dorp, Dennis; Arnauts, Sophia; Laitinen, Mikko; Sajavaara, Timo; Meersschaut, Johan; Conard, Thierry; Holsteyns, Frank; Kelly, John (2018) -
Nanoscale etching of III-V semiconductors in acidic hydrogen peroxide solution: GaAs and InP, a striking contrast
van Dorp, Dennis; Arnauts, Sophia; Laitinnen, Mikko; Sajavaara, Timo; Meersschaut, Johan; Conard, Thierry; Kelly, John (2019) -
Nanoscale etching of In0.53Ga0.47As for advanced CMOS processing
van Dorp, Dennis; Arnauts, Sophia; Cuypers, Daniel; Rip, Jens; Holsteyns, Frank; De Gendt, Stefan; Kelly, John (2014) -
Wet-chemical etching of III-V semiconductors: towards atomic-layer-scale processing
van Dorp, Dennis; Arnauts, Sophia; Kelly, John; Holsteyns, Frank (2019)