Now showing items 1-2 of 2

    • Calibrated PSCAR stochastic simulation 

      Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019)
    • EUV resist performance enhancement by UV flood exposure for high NA EUV lithography 

      Cong Que Dinh; Nagahara, Seiji; Yoshida, Keisuke; Kondo, Yoshihiro; Muramatsu, Makoto; Yoshihara, Kosuke; Shimada, Ryo; Moriya, Teruhiko; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert (2021)