Browsing by author "Delorme, Max"
Now showing items 1-3 of 3
-
Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid
Woltgens, Pieter; Colina, Alberto; Rio, David; Delorme, Max; Kovalevich, Tatiana; Thiam, Arame; Van Roey, Frieda; Zografos, Odysseas (2022-05-26) -
Mask Contribution to OPC Model Accuracy
Lyons, Adam; Wallow, Tom; Hennerkes, Christoph; Spence, Chris; Delorme, Max; Rio, David; Tsunoda, Dai; Torigoe, Yohei; Hamaji, Masakazu (2020) -
NXE:3400 OPC Process Monitoring: Model Validity vs. Process Variability
Xu, Dongbo; Rio, David; Gillijns, Werner; Delorme, Max; Baerts, Christina (2021-02-22)