Browsing by author "Voloshin, Dmitry"

Now showing items 1-2 of 2

Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration

Zyulkov, Ivan; Voronina, Ekaterina; Krishtab, Mikhail; Voloshin, Dmitry; Chan, BT; Mankelevich, Yuri; Rakhimova, Tatyana; Armini, Silvia; De Gendt, Stefan (2020)
Experimental and theoretical studies of radical production in RF CCP discharge at 81-MHz frequency in Ar/CF4 and Ar/CHF3 mixtures

Rakhimova, Tatyana; Braginsky, OLEG; Klopovskiy, Konstantin; Kovalev, Alexander; Lopaev, Dmitry; Proshina, Olga; Rakhimov, Alexander; Shamiryan, Denis; Vasilieva, Anna; Voloshin, Dmitry (2009)