Browsing by author "Drapeau, Martin"
Now showing items 1-2 of 2
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A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond
Drapeau, Martin; van Adrichem, Paul.J.M.; Van Look, Lieve; Kasprowicz, Bryan S. (2005) -
Double patterning design split implementation and validation for the 32nm node
Drapeau, Martin; Wiaux, Vincent; Hendrickx, Eric; Verhaegen, Staf; Machida, Takahiro (2007)