Publication:
A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond
Date
Loading...
Journal
Abstract
Description
Statistics
Views
1918 since deposited on 2021-10-16
2last month
Acq. date: 2026-04-07
Citations
Statistics
Views
1918 since deposited on 2021-10-16
2last month
Acq. date: 2026-04-07
Citations