Publication:
A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond
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1914 since deposited on 2021-10-16
2last month
1last week
Acq. date: 2026-01-07
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Views
1914 since deposited on 2021-10-16
2last month
1last week
Acq. date: 2026-01-07
Citations