Publication:

A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond

Date

Loading...
Thumbnail Image

Abstract

Description

Metrics

Views

1912 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-11

Citations

Metrics

Views

1912 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-11

Citations