Publication:
A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond
Date
| dc.contributor.author | Drapeau, Martin | |
| dc.contributor.author | van Adrichem, Paul.J.M. | |
| dc.contributor.author | Van Look, Lieve | |
| dc.contributor.author | Kasprowicz, Bryan S. | |
| dc.contributor.imecauthor | Van Look, Lieve | |
| dc.date.accessioned | 2021-10-16T01:25:12Z | |
| dc.date.available | 2021-10-16T01:25:12Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10403 | |
| dc.source.beginpage | 59921T | |
| dc.source.conference | 25th Annual BACUS Symposium on Photomask Technology | |
| dc.source.conferencedate | 3/10/2005 | |
| dc.source.conferencelocation | Monterey, CA USA | |
| dc.title | A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |