Browsing by author "Rathsack, Ben"
Now showing items 1-7 of 7
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Addressing the challenges of Directed Self Assembly implementation
Gronheid, Roel; Pollentier, Ivan; Younkin, Todd; Somervell, Mark; Nafus, Kathleen; Hooge, Josh; Rathsack, Ben; Scheer, Steven; Rincon Delgadillo, Paulina; Nealy, Paul (2011) -
Comparison of directed self-assembly integrations
Somervell, Mark; Gronheid, Roel; Hooge, Joshua; Nafus, Kathleen; Rincon Delgadillo, Paulina; Thode, Chris; Younkin, Todd; Matsunaga, Koichi; Rathsack, Ben; Scheer, Steven; Nealy, Paul (2012) -
DSA patterning scaling through lithography and etch process integration
Rathsack, Ben; Gronheid, Roel (2012) -
EUV RLS performance tradeoffs for a polymer bound PAG resist process
Rathsack, Ben; Hooge, Josh; Somervell, Mark; Scheer, Steve; Nafus, Kathleen; Shite, Hideo; Bradon, Neil; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009) -
Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials
Rathsack, Ben; Scheer, Steven; Kuwahara, Yuhei; Kitano, Junichi; Gronheid, Roel; Baerts, Christina (2008) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
World-wide standardization effort on leaching measurement methodology
Gronheid, Roel; Baerts, Christina; Caporalo, Stefan; Alexander, Jim; Rathsack, Ben; Scheer, Steven; Ohmori, Katsumi; Rice, Bryan (2007)