EUV RLS performance tradeoffs for a polymer bound PAG resist process

Thumbnail
View/open
Metadata
Show full item record
Authors
Rathsack, Ben; Hooge, Josh; Somervell, Mark; Scheer, Steve; Nafus, Kathleen; Shite, Hideo; Bradon, Neil; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro
Conference
International Symposium on Extreme Ultraviolet Lithography
Title
EUV RLS performance tradeoffs for a polymer bound PAG resist process
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections