Publication:

EUV RLS performance tradeoffs for a polymer bound PAG resist process

Date

2009
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorRathsack, Ben
dc.contributor.authorHooge, Josh
dc.contributor.authorSomervell, Mark
dc.contributor.authorScheer, Steve
dc.contributor.authorNafus, Kathleen
dc.contributor.authorShite, Hideo
dc.contributor.authorBradon, Neil
dc.contributor.authorKitano, Junichi
dc.contributor.authorGronheid, Roel
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.date.accessioned2021-10-18T02:13:22Z
dc.date.available2021-10-18T02:13:22Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16098
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

EUV RLS performance tradeoffs for a polymer bound PAG resist process

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
19627.pdf
Size:
164.55 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions