Browsing by author "Mulkens, J."

Now showing items 1-3 of 3

    • Advanced 193 nm step and scan technology 

      Stoeldraijer, J.; Mulkens, J.; Davies, G.; Sytsma, J.; Bakker, H.; Glatzel, H.; Wagner, C.; Roempp, O.; Boerret, R.; Goethals, Mieke (1998)

    • ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes 

      Mulkens, J.; Stoeldraijer, J.; Davies, G.; Dierichs, M.; Heskamp, B.; Moers, M. H.; George, R. A.; Roempp, O.; Glatzel, H.; Wagner, C.; Pollers, Ingrid; Jaenen, Patrick (1999)

    • Introducing 193 nm lithography 

      Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Davies, G.; Heskamp, B.; Bakker, H.; McCoo, E.; Mulkens, J.; Stoeldraijer, J.; Sytsma, J.; Van der Vleuten, B.; Vleeming, Bert; Tzviatkov, Plamen; Van Driessche, Veerle; Slater, S. (1998)