Now showing items 1-2 of 2

    • Recent advancements in 157nm resist performance 

      Turnquest, K.; Graffenberg, V.; Patel, S.; Miller, D.; Dean, K.; Goethals, Mieke; Van Roey, F.; Hermans, J.; Ronse, Kurt; Wong, P.; Hansen, S. (2002)
    • UV2Litho: usable vacuum ultra violet lithography 

      Goethals, Mieke; Jonckheere, Rik; Van Roey, F.; Hermans, J.; Eliat, Astrid; Ronse, Kurt; Wong, P.; Zandbergen, P.; Vasconi, M.; Severgnini, E.; Henke, W.; Hohle, C.; Henry, D.; Thony, P.; Markey, L.; Schiavone, P.; Fuard, D. (2002)