Now showing items 1-3 of 3

    • EUV lithography with the alpha demo tools: status and challenges 

      Harned, Noreen; Goethals, Mieke; Groeneveld, Rogier; Kuerz, Peter; Lowisch, Martin; Meijer, Henk; Meiling, Hans; Ronse, Kurt; Ryan, Jim; Tittnich, Mike; Voorma, Harm-Jan; Zimmmerman, John; Mickan, Uwe; Lok, Sjoerd (2007)
    • Impact of an etched EUV mask black border on imaging and overlay 

      de Kruif, Rob; Davydova, Natalia; Connolly, Brid; Fukugami, Norihito; Lammers, Ad; Philipsen, Vicky; Kondo, Shinpei; Van Setten, Eelco; Vaenkatesan, Vidya; Zimmerman, John; Harned, Noreen (2012)
    • Performance of the full field EUV systems 

      Meiling, Hans; Boon, Edwin; Buzing, Nico; Cummings, Kevin; Frijns, Olav; Galloway, Judy; Goethals, Mieke; Harned, Noreen; Hultermans, Bas; de Jonge, Roel; Kessels, Bart; Kuerz, Peter; Lok, Sjoerd; Lowisch, Martin; Mallman, Joerg; Pierson, Bill; Ronse, Kurt; Ryan, James G.; Smitt-Weaver, Emil; Tittnich, Michael D.; Wagner, Christian; van Dijk, Anton; Zimmerman, John (2008)