Browsing by author "Xu, Hao"
Now showing items 1-3 of 3
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Alleviation of Negative-Bias Temperature Instability in Si p-FinFETs With ALD W Gate-Filling Metal by Annealing Process Optimization
Zhou, Longda; Liu, Qianqian; Yang, Hong; Ji, Zhigang; Xu, Hao; Wang, Guilei; Simoen, Eddy; Jiang, Haojie; Luo, Ying; Kong, Zhenzhen; Bai, Guobin; Luo, Jun; Yin, Huaxiang; Zhao, Chao; Wang, Wenwu (2021) -
Comparative study on NBTI kinetics in Si p-FinFETs with B2H6-based and SiH4-based atomic layer deposition tungsten (ALD W) filling metal
Zhou, Longda; Wang, Guilei; Yin, Xiaogen; Ji, Zhigang; Liu, Qianqian; Xu, Hao; Yang, Hong; Simoen, Eddy; Wang, Xiaolei; Ma, Xueli; Li, Yongliang; Kong, Zhenzhen; Jiang, Haojie; Luo, Ying; Yin, Huaxiang; Zhao, Chao; Wang, Wenwu (2020) -
Degradation Mechanism of Short Channel p-FinFETs under Hot Carrier Stress and Constant Voltage Stress
Chang, Hao; Zhou, Longda; Yang, Hong; Ji, Zhigang; Liu, Qianqian; Xu, Hao; Simoen, Eddy; Yin, Huaxiang; Wang, Wenwu (2020)