Browsing by author "Kam, Benjamin"
Now showing items 1-2 of 2
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Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning
Xu, Dongbo; Gillijns, Werner; Wu, Stewart; Jambaldinni, Shruti; Kam, Benjamin; De Silva, Anuja; Fenger, Germain (2024) -
Overlay Metrology Performance of Dry Photoresist Towards High NA EUV Lithography
Canga, Eren; Blanco, Victor; Charley, Anne-Laure; Tabery, Cyrus; Zacca, Gabriel; Shamma, Nader; Kam, Benjamin; Brouri, Mohand (2024)