Browsing by author "Tritchkov, Alexander"
Now showing items 21-23 of 23
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Sub-resolution feature OPC as an enabler for manufacturing at 0.2 μm and below
Randall, John; Tritchkov, Alexander; Ronse, Kurt; Jaenen, Patrick (1998) -
Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm
Goethals, Mieke; Vertommen, Johan; Van Roey, Frieda; Yen, Anthony; Tritchkov, Alexander; Ronse, Kurt; Jonckheere, Rik; Van den hove, Luc (1996) -
Use of positive and negative chemically amplified resists in electron-beam direct-write lithography
Tritchkov, Alexander; Jonckheere, Rik; Van den hove, Luc (1995)