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Sub-resolution feature OPC as an enabler for manufacturing at 0.2 μm and below
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Authors
Randall, John
;
Tritchkov, Alexander
;
Ronse, Kurt
;
Jaenen, Patrick
Journal
Microelectronic Engineering
Volume
41/42
Title
Sub-resolution feature OPC as an enabler for manufacturing at 0.2 μm and below
Publication type
Journal article
Embargo date
9999-12-31
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