Browsing by imec author "8ab57f628a3c49cc593b0c8d4c597f33636ce0e4"
Now showing items 21-25 of 25
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NXE:3400 OPC Process Monitoring: Model Validity vs. Process Variability
Xu, Dongbo; Rio, David; Gillijns, Werner; Delorme, Max; Baerts, Christina (2021-02-22) -
Qualification of electrical linewidth measurements (ELM) as a metrology tool for 0.18μm and below
Marschner, Thomas; Pollentier, Ivan; Baerts, Christina; Boltz, Ingo; Ronse, Kurt; Van den hove, Luc; Finders, Jo; Gangala, Hareen K; Capodieci, Luigi (1998) -
RMG nMOS 1st process enabling 10x lower gate resistivity in N7 bulk FinFETs
Ragnarsson, Lars-Ake; Dekkers, Harold; Schram, Tom; Chew, Soon Aik; Parvais, Bertrand; Dehan, Morin; Devriendt, Katia; Tao, Zheng; Sebaai, Farid; Baerts, Christina; Van Elshocht, Sven; Yoshida, Naomi; Phatak, Anup; Lazik, Christoph; Brand, Adam; Clark, William; Fried, David; Mocuta, Dan; Barla, Kathy; Horiguchi, Naoto; Thean, Aaron (2015) -
Sub-50nm gate patterning using line-trimming with 248nm or 193nm litho
Pollentier, Ivan; Jaenen, Patrick; Baerts, Christina; Ronse, Kurt (2002) -
World-wide standardization effort on leaching measurement methodology
Gronheid, Roel; Baerts, Christina; Caporalo, Stefan; Alexander, Jim; Rathsack, Ben; Scheer, Steven; Ohmori, Katsumi; Rice, Bryan (2007)