Influence of UV irradiation on the removal of post-etch photoresist in porous low-k dielectric patterning

Publication:

2009

Proceedings Paper

Author(s)

Kesters, Els

;

Le, Quoc Toan

;

;

Baerts, Christina

;

Onandia, Laura

;

Vereecke, Guy

1910 since deposited on 2021-10-17

Acq. date: 2026-09-15