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    • Novel patterning shrink technique enabling sub-50nm trench and contact integration 

      Demuynck, Steven; Tokei, Zsolt; Zhao, Chao; de Marneffe, Jean-Francois; Struyf, Herbert; Boullart, Werner; Op de Beeck, Maaike; Carbonell, Laure; Heylen, Nancy; Vaes, Jan; Beyer, Gerald; Vanhaelemeersch, Serge; Zhu, Helen; Cirigliano, Peter; Kim, J. S.; Vertommen, Johan; Coenegrachts, Bart; Sadjadi, R.; Pavel, E.; Athayde, A. (2007)