Publication:

Novel patterning shrink technique enabling sub-50nm trench and contact integration

Date

2007
Proceedings Paper
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16239.pdf 1.67 MB

Author(s)

Demuynck, Steven  
;
Tokei, Zsolt  
;
Zhao, Chao
;
de Marneffe, Jean-Francois  
;
Struyf, Herbert  
;
Boullart, Werner  
;
Op de Beeck, Maaike  
;
Carbonell, Laure
;
Heylen, Nancy  
;
Vaes, Jan
;
Beyer, Gerald  
;
Vanhaelemeersch, Serge  
;
Zhu, Helen
;
Cirigliano, Peter
;
Kim, J. S.
;
Vertommen, Johan  
;
Coenegrachts, Bart  
;
Sadjadi, R.
;
Pavel, E.
;
Athayde, A.

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1981 since deposited on 2021-10-16
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Acq. date: 2026-04-06

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