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Novel patterning shrink technique enabling sub-50nm trench and contact integration
Publication:
Novel patterning shrink technique enabling sub-50nm trench and contact integration
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Date
2007
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Demuynck, Steven
;
Tokei, Zsolt
;
Zhao, Chao
;
de Marneffe, Jean-Francois
;
Struyf, Herbert
;
Boullart, Werner
;
Op de Beeck, Maaike
;
Carbonell, Laure
;
Heylen, Nancy
;
Vaes, Jan
;
Beyer, Gerald
;
Vanhaelemeersch, Serge
;
Zhu, Helen
;
Cirigliano, Peter
;
Kim, J. S.
;
Vertommen, Johan
;
Coenegrachts, Bart
;
Sadjadi, R.
;
Pavel, E.
;
Athayde, A.
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1974
since deposited on 2021-10-16
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last month
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last week
Acq. date: 2026-01-08
Citations
Metrics
Views
1974
since deposited on 2021-10-16
1
last month
1
last week
Acq. date: 2026-01-08
Citations