Show simple item record

Band alignment between (100)Si and Hf-based complex metal oxides

dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorStesmans, Andre
dc.contributor.authorZhao, Chao
dc.contributor.authorCaymax, Matty
dc.contributor.authorRittersma, Z.M.
dc.contributor.authorMaes, Jan
dc.date.accessioned2021-10-16T00:42:30Z
dc.date.available2021-10-16T00:42:30Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10005
dc.sourceIIOimport
dc.titleBand alignment between (100)Si and Hf-based complex metal oxides
dc.typeJournal article
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorStesmans, Andre
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMaes, Jan
dc.source.peerreviewno
dc.source.beginpage102
dc.source.endpage105
dc.source.journalMicroelectronic Engineering
dc.source.issue80
dc.source.volume80
imec.availabilityPublished - imec
imec.internalnotes14th Biennial Conference on Insulating Films on Semiconductors; 22-24 June 2005


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record