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Massively parallel electromagnetic simulation for photolithographic applications

dc.contributor.authorWong, Alfred
dc.contributor.authorGuerrieri, R.
dc.contributor.authorNeureuther, A. R.
dc.date.accessioned2021-09-29T13:26:37Z
dc.date.available2021-09-29T13:26:37Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1025
dc.sourceIIOimport
dc.titleMassively parallel electromagnetic simulation for photolithographic applications
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage1231
dc.source.endpage1240
dc.source.journalIEEE Trans. Computer-Aided Design of Integrated Circuits and Systems
dc.source.volume14
imec.availabilityPublished - imec


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