Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications
dc.contributor.author | Wong, Alfred | |
dc.contributor.author | Neureuther, A. R. | |
dc.date.accessioned | 2021-09-29T13:26:41Z | |
dc.date.available | 2021-09-29T13:26:41Z | |
dc.date.issued | 1995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1026 | |
dc.source | IIOimport | |
dc.title | Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications | |
dc.type | Journal article | |
dc.source.peerreview | no | |
dc.source.beginpage | 419 | |
dc.source.endpage | 431 | |
dc.source.journal | IEEE Trans. Semiconductor Manufacturing | |
dc.source.issue | 4 | |
dc.source.volume | 8 | |
imec.availability | Published - imec |
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