dc.contributor.author | Eitoku, Atsuro | |
dc.contributor.author | Snow, Jim | |
dc.contributor.author | Vos, Rita | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Mertens, Paul | |
dc.date.accessioned | 2021-10-16T01:28:39Z | |
dc.date.available | 2021-10-16T01:28:39Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10422 | |
dc.source | IIOimport | |
dc.title | Influences of oxide loss on contamination removal | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vos, Rita | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.source.peerreview | no | |
dc.source.beginpage | 177 | |
dc.source.endpage | 180 | |
dc.source.conference | Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium | |
dc.source.conferencedate | 20/09/2004 | |
dc.source.conferencelocation | Brussel Belgium | |
imec.availability | Published - imec | |
imec.internalnotes | Solid State Phenomena Vol 103-104 | |