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Influences of oxide loss on contamination removal

dc.contributor.authorEitoku, Atsuro
dc.contributor.authorSnow, Jim
dc.contributor.authorVos, Rita
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-16T01:28:39Z
dc.date.available2021-10-16T01:28:39Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10422
dc.sourceIIOimport
dc.titleInfluences of oxide loss on contamination removal
dc.typeProceedings paper
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.beginpage177
dc.source.endpage180
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena Vol 103-104


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