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EUV resist screening: current performance and issues

dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.authorLeunissen, Peter
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorSolak, Harun
dc.date.accessioned2021-10-16T01:44:54Z
dc.date.available2021-10-16T01:44:54Z
dc.date.issued2005-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10503
dc.sourceIIOimport
dc.titleEUV resist screening: current performance and issues
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVan Roey, Frieda
dc.source.peerreviewno
dc.source.beginpage647
dc.source.endpage654
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue5
dc.source.volume18
imec.availabilityPublished - imec


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