Dose dependent phenomena arising from implantation of Er into Si
dc.contributor.author | Hogg, S.M. | |
dc.contributor.author | Pipeleers, B. | |
dc.contributor.author | Vantomme, Andre | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Richard, Olivier | |
dc.contributor.author | Swart, M. | |
dc.date.accessioned | 2021-10-16T02:07:31Z | |
dc.date.available | 2021-10-16T02:07:31Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10600 | |
dc.source | IIOimport | |
dc.title | Dose dependent phenomena arising from implantation of Er into Si | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vantomme, Andre | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.imecauthor | Richard, Olivier | |
dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 083514-1 | |
dc.source.endpage | 083514-8 | |
dc.source.journal | J. Applied Physics | |
dc.source.issue | 8 | |
dc.source.volume | 97 | |
imec.availability | Published - imec |
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