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One-mask CMOS compatible process for the fabrication of three-dimensional self-assembled thin-film SOI microelectromechanical systems

dc.contributor.authorIker, Francois
dc.contributor.authorAndré, N.
dc.contributor.authorPardoen, T.
dc.contributor.authorRaskin, J.P.
dc.date.accessioned2021-10-16T02:15:49Z
dc.date.available2021-10-16T02:15:49Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10633
dc.sourceIIOimport
dc.titleOne-mask CMOS compatible process for the fabrication of three-dimensional self-assembled thin-film SOI microelectromechanical systems
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpageH87
dc.source.endpageH89
dc.source.journalElectrochemical and Solid State Letters
dc.source.issue10
dc.source.volume8
imec.availabilityPublished - imec


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