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Removal of plasma-modified low-k layer using dilute HF: influence of concentration

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorKesters, Els
dc.contributor.authorAzioune, Ammar
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.contributor.authorPireaux, Jean-Jacques
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-10-16T02:49:05Z
dc.date.available2021-10-16T02:49:05Z
dc.date.issued2005-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10758
dc.sourceIIOimport
dc.titleRemoval of plasma-modified low-k layer using dilute HF: influence of concentration
dc.typeJournal article
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpageF21
dc.source.endpageF24
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue7
dc.source.volume8
imec.availabilityPublished - imec


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